Hiden Analytical Ltd

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- YEAR FOUNDED

Hiden Analytical was founded in 1981 and is presently situated in a 2,130m2 manufacturing plant in Warrington, England with a staff of 60. As a privately owned company our reputation is built on creating close and positive relationships with our clients. Many of these customers are working at the forefront of new technology - in the fields of plasma research, surface science, vacuum processing and gas analysis.

To maintain this reputation we have, over the years, established exceptional levels of technical expertise in these areas within our company. Hiden Analytical is committed to providing systems which meet specifications of both new and existing clients, but further, enable the advancement of their work, whether it be pure research or the improvements or monitoring of products and process performance.

  • Gas Analysis
  • Plasma Diagnostics
  • Surface Science
  • Vacuum Analysis

Application Areas Include:

  • Plasma Characterisation
  • Gas Analysis
  • SIMS Surface Analysis
  • Thin Films and Surface Engineering
  • Catalysis
  • UHV Surface Science
  • Surface Analysis
  • Vacuum Processing
  • Thermal Analysis
  • Nanotechnology
  • Residual Gas Analysis
  • Dissolved Species Analysis
  • Molecular Beam Studies

Industries Served

  • Pharmaceutical
  • Semiconductor
  • Chemical
  • Automotive
  • Aerospace
  • Food

Gas Analysis

Gas Analysis - Real time gas analysers that address the broadest application range. Multiple species - PPB to 100% measurement range. Advanced real-time gas analysers. Continuous sampling of processes and atmospheres near ambient pressure. Real time gas analysers that address the broadest application range. Multiple species - PPB to 100% measurement range.

QGA - Atmospheric Gas Analysis System
The QGA gas analysis system is a compact bench-top gas analysis system for real time gas and vapour analysis

HPR-20 QIC Realtime Gas Analyser for Multiple Species Gas and Vapour Analysis
The HPR QIC-20 gas analysis system is a compact bench-top gas analysis system for monitoring gases and processes at pressures up to atmosphere

QIC-100 Realtime Gas Analysis System with mass range to 1000 amu
The QIC-100 gas analysis system is a compact mobile cart gas analysis system for monitoring gases and processes at pressures up to atmosphere

QIC Biostream - Multi Stream Gas/Vapour Analyser
An integrated mass spectrometer and selector valve system for multi-stream analysis

Catalyst Characterisation

Catalysis - Automated micro reactors and mass spectrometers for catalyst researchers

CATLAB - Micro-reactor with integrated Mass Spectrometer for Catalysis Studies
The CATLAB-PCS microreactor module for the combined roles of catalyst characterisation and rapid, reproducible screening of catalyst activity

SpaciMS - for determination of intra catalyst reactor chemistry
The SpaciMS inlet is designed for the minimally invasive study of reaction chemistry in confined space reactors - offering unique insight into intra-catalyst chemistry

Surface Science & Materials Analysis

SIMS Surface Analysis - SNMS/SIMS analysis for depth profiling, imaging and quantitative thin film composition analysis. SIMS Workstation, SIMS Analysers, Ion Guns and TPD Workstation

SIMS is a high sensitivity surface analysis technique for the determination of surface composition, contaminant analysis and for depth profiling in the uppermost surface layers of a sample. Applied to analysis within the first few microns of a surface, Hiden's SIMS systems provide depth profiles with depth resolution to 5 nanometres.

The Hiden SIMS workstation provides for high performance static and dynamic SIMS applications for detailed surface composition analysis and depth profiling.

EQS, a Secondary Ion Mass Spectrometer bolt on SIMS Analyser
State of the art, bolt-on SIMS probe for integration into your existing UHV surface science chamber

SIMS Workstation, a UHV Surface Analysis System, for thin film depth profiling
The Hiden SIMS Workstation, an integrated UHV/SIMS facility for advanced surface analysis

Secondary ion mass spectrometer for UHV surface analysis and SNMS. The Hiden MAXIM.
MAXIM
the most sensitive quadrupole SIMS analyser for the most sensitive elemental analysis technique

IDP Mass Spectrometer for analysis of ions, neutrals and radicals in UHV desorption studies.
The only mass spectrometer for the mass and energy analysis of ions, neutrals and radicals in electron and photon stimulated desorption studies

TPD Workstation for UHV Thermal Desorption Studies
The Hiden TPD Workstation is a complete experimental system for UHV temperature programmed desorption (TPD) studies

IG20 5 KeV Argon or Oxygen ion source for UHV surface analysis applications.
The Hiden IG20 Ion Gun for static and dynamic SIMS

IG5C 5KeV Caesium Ion Source for UHV Surface Analysis applications
Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package

IFG200 Fast Atom Bombardment Ion Gun
State of the art FAB/ion gun for surface and depth analysis applications

Gas Analysis

HPR - Gas Analysers
HPR - Gas Analysers, with sample inlets to address a broad application range

HPR-40 MIMS membrane inlet mass spectrometer for gas analysis , vapours and VOCs in liquids
Rapid, quantitative analysis of reactive/corrosive mixtures in your chamber/produced in your process

HPR-50 Gas Analyser for Diamond CVD
The HPR-50 jet separator mass spectrometer, a dedicated, custom-designed gas analysis system for monitoring of
diamond growth processes

HPR-60
MBMS Molecular Beam Sampling Mass Spectrometer for analysis of neutrals, radicals and ions
For collisionless molecular beam analysis of high-speed, atmospheric pressure processes

HPR-70 Batch Inlet Gas Analysis System for static gas analysis of small volume samples
Sub ppm quantitative analysis of all components in your sealed/discrete volumes

HPR-90 Sealed Package Gas Analyser with Integral Package Cracker for lamp gas analysis
Rapid, quantitative analysis of reactive/corrosive mixtures in your chamber/produced in your process

Plasma Characterisation

Plasma Characterisation - Get detailed information relating to plasma reactions. +ve/-ve ions, radicals, neutrals and electron density measurement

EQP - Mass and Energy Analyser for Plasma Diagnostics
Complete energy resolved mass speciation and mass resolved energy analysis of all species in your plasma

ESPion, an Advanced Langmuir Probe for Plasma Diagnostics
The most advanced and reliable Langmuir Probe for rapid and accurate plasma diagnostics for industry and academia

PSM, a Mass and Energy Analyser for Plasma Diagnostics
Complete energy resolved mass speciation and mass resolved energy analysis of secondary ions and neutrals in your plasma

HPR30 Vacuum Process Gas Analyser
A compact gas analysis system for monitoring residual gases and vacuum processes.

ICP Plasma Workstation with EQP Ion Mass and Energy Analyser for plasma research
Combined mass/energy analysis of all species in your RF plasma process 

Residual Gas Analysers

Residual Gas Analysers for vacuum diagnostics, leak detection and process monitoring

Hiden RGA series quadrupole mass spectrometers for the examination of components present in a vessel or evolved from a process

HPR-30 Vacuum Process Gas Analyser
For the examination of all the components present in your chamber or evolved from your system

Triple Filter Quadrupole Mass Spectrometers for Precision Gas Analysis
A specifically designed system for high performance corrosive gas analysis and monitoring for semiconductor and vacuum processes

HMT100-RC - High Pressure Residual Gas Analyser
Hiden HAL 3F mass spectrometers for high precision scientific, process applications and UHV applications

Gas Sampling Valves


Proteus Multi-Stream Gas Selector Valve
The unique multi-port selector valve system for multi-stream analysis

8 way Multi-Stream Gas Switching Manifold
A multi-port selector valve system for multi-stream analysis

Process Control Systems

Hiden Ion Milling Probe - End point detector for ion beam etch
The IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for the analysis of secondary ions and neutral from the ion mill process. The only dedicated end point determination tool for ion etch control and optimum process quality.
 

XBS Triple Filter Mass Spectrometer configured for k-cell and e-gun MBE Deposition Rate Monitoring
XBS Triple Filter Quadrupoles configured for multiple source monitoring in MBE deposition applications. The custom configured ioniser provides for high stability, high senstivity monitoring of oxides and metals from both k-cell and e-gun sources
 

Triple Filter Quadrupoles

Triple Filter Quadrupole Mass Spectrometers for Precision Gas Analysis
Hiden HAL 3F mass spectrometers for high precision scientific, process applications and UHV applications

PIC Mass Spectrometers for UHV TPD and fast event gas analysis
Hiden PIC mass spectrometers for high precision scientific, process applications and UHV TPD

EPIC Quadrupole mass spectrometers for UHV analysis of neutrals, radicals and ions
Hiden EPIC mass spectrometers for high precision scientific, process applications and UHV analysis of neutrals, radicals, and ions

Hiden Quadrupole Mass Spectrometer Components
An extensive range of mass filter assemblies, ion sources and RF supplies

UHV Surface Science - Surface Analysis

UHV Surface Science - Surface Analysis

SIMS - for depth profiling, surface composition measurement, and elemental imaging, Hiden's SIMS Workstation provides a complete analytical facility.

RGA - The Hiden quadrupole mass spectrometers provide high sensitivity detection capability for the most demanding XHV/UHV vacuum environments. The pulse ion counting detector enables measurement of both positive and negative ions through 7 continuous decades, the integral accumulation mode being used for the capture of discreet particle events.

UHV Temperature Programmed desorption studies (TPD) - Hiden Analytical’s 3F/PIC mass spectrometers with pulse ion counting detection are available configured specifically for UHVTPD providing fast, wide dynamic range detection of multiple species, capturing the entire desorption event. The temperature ramp data is automatically acquired simultaneously with the mass spectral data.

The Hiden IDP ion desorption probe is a quadrupole mass spectrometer configured for analysis of low energy ions in electron and photon stimulated desorption studies.

EQS, a Secondary Ion Mass Spectrometer bolt on SIMS Analyser - The EQS secondary ion mass spectrometer for the analysis of secondary positive and negative ions from solid samples. State of the art, bolt-on SIMS probe for integration into your existing UHV surface science chamber.

RGA Series Quadrupole Mass Spectrometers - Hiden RGA series quadrupole mass spectrometers for the examination of components present in a vessel or evolved from a process, for vacuum diagnostics and leak detection.

TPD Workstation for UHV Thermal Desorption Studies - The Hiden TPD Workstation is a complete experimental system for UHV temperature programmed desorption (TPD) studies.

EPIC Quadrupole mass spectrometers for UHV analysis of neutrals, radicals and ions - Hiden EPIC mass spectrometers for high precision scientific, process applications and UHV analysis of neutrals, radicals, and ions. Triple Filter Quadrupoles for Precision Gas Analysis and Scientific Applications.

Nanotechnology

Nanotechnology is research and technology development at the atomic, molecular or macromolecular levels, in the length scale of approximately 1 - 100 nanometre range, combined with creating and using structures, devices and systems that have novel properties and functions because of their small and/or intermediate size and with the ability to control or manipulate on the atomic scale.

Hiden’s quadrupole mass spectrometers provide vacuum, plasma and surface analysis in nanotechnology applications, including SIMS depth profiling of nanometre scale thin film structures, plasma characterisation for enhancement of device etch processes, and vacuum diagnostics / temperature programmed desorption analysers in UHV scanning tunnelling microscopes.

SIMS Workstation - a UHV Surface Analysis System, for thin film depth profiling.

XBS Triple Filter Mass Spectrometer configured for k-cell and e-gun MBE Deposition Rate Monitoring.

TPD Workstation for UHV Thermal Desorption Studies

Molecular Beam Studies

Molecular Beam Studies

Hiden’s 3F/PIC mass spectrometers with pulse ion counting detection system and integral signal gating enable effective molecular beam analysis. Integral delay timers provide for automatic acquisition of foreground and background signal in pulsed or chopped molecular beam experiments.

Hiden’s cross beam ioniser/analyser shroud analyser accessories enable high sensitivity molecular beam analyses whilst preventing ioniser and quadrupole analyser contamination from condensable species within the beam.

Custom designed analyser length extension, analyser shrouds, and analyser housings are available to provide an optimum analyser gauge configuration to suit new or existing molecular beam experiment chambers.

PIC Mass Spectrometers for UHV TPD and fast event gas analysis

EPIC Quadrupole mass spectrometers for UHV analysis of neutrals, radicals and ions

Industry

Pharmaceutical - Real time analysis of organic vapours and moisture in reactions

Semiconductor - Process monitoring for advanced manufacturing processes

Chemical  - R&D and process monitoring for gas/vapour analysis

Automotive - Exhaust gas emissions, fuel cell technology, catalysts

Aerospace - Development of special materials, hard coatings and metallurgical films

Food  - Quadrupole mass spectrometry for the food industry

Application Areas Include

Plasma Characterisation - Get detailed information relating to plasma reactions. +ve/-ve ions, radicals, neutrals and electron density measurement
Gas Analysis
- Real time gas analysers that address the broadest application range. Multiple species - PPB to 100% measurement range
SIMS Surface Analysis
- SNMS/SIMS analysis for depth profiling, imaging and quantitative thin film composition analysis
Thin Films and Surface Engineering
- RGA, plasma ion analysis, surface analysis and SIMS end point detection
Catalysis
- Automated micro reactors and mass spectrometers for catalyst researchers
UHV Surface Science
- High sensitivity detection for the most demanding XHV/UHV environments
Surface Analysis
- High sensitivity thin film surface analysis
Vacuum Processing
- Residual gas analysis. leak detection and contamination monitoring
Thermal Analysis
- Evolved gas analysis as a function of time and temperature.
Nanotechnology
- R&D at the atomic, molecular or macromolecular level
Residual Gas Analysis
- Analysis of gas and vapour species in vacuum chambers and processes
Dissolved Species Analysis
- Respiratory gases, hydrocarbons and vapour analysis in bio fuel research and ecological studies
Molecular Beam Studies
- Supersonic pulsed beam studies at UHV MBMS
 

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